TY  - BOOK
AU  - Vernardou, Dimitra
TI  - Advances in Chemical Vapor Deposition
KW  - APCVD||VO2||processing parameters||2D||chemical vapor deposition||atomic layer deposition||aluminum oxide||aluminum tri-sec-butoxide||thin film||carbon nanotubes||residual gas adsorption||residual gas desorption||field emission||atmospheric pressure CVD||low pressure CVD||hybrid CVD||aerosol assisted CVD||pulsed CVD||perovskite photovoltaic nanomaterials||stabilization||structural design||performance optimization||solar cells||anatase single crystals||process-induced nanostructures||competitive growth||pp-MOCVD||vanadium pentoxide||electrochromic||spray pyrolysis||ammonium metavanadate||CVD||electrochromism||perovskite photovoltaic materials||TiO2||Al2O3||V2O5||computational fluid dynamics
UR  - https://mdpi.com/books/pdfview/book/3311
ER  -