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Advances in Chemical Vapor Deposition

Contributor(s):

Vernardou, Dimitra

Material type: Text

Text

TextSubject(s):

APCVD||VO2||processing parameters||2D||chemical vapor deposition||atomic layer deposition||aluminum oxide||aluminum tri-sec-butoxide||thin film||carbon nanotubes||residual gas adsorption||residual gas desorption||field emission||atmospheric pressure CVD||low pressure CVD||hybrid CVD||aerosol assisted CVD||pulsed CVD||perovskite photovoltaic nanomaterials||stabilization||structural design||performance optimization||solar cells||anatase single crystals||process-induced nanostructures||competitive growth||pp-MOCVD||vanadium pentoxide||electrochromic||spray pyrolysis||ammonium metavanadate||CVD||electrochromism||perovskite photovoltaic materials||TiO2||Al2O3||V2O5||computational fluid dynamics

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Holdings
Item type	Current library	Call number	Status	Date due	Barcode
E-Books	Kerala University of Digital Sciences, Innovation and Technology Knowledge Centre		Available

English[eng]

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