| 000 | 00673nam a2200121Ia 4500 | ||
|---|---|---|---|
| 008 | 220615s9999||||xx |||||||||||||| ||und|| | ||
| 100 | _aJiménez, Carmen||Bellet, Daniel||Masse de la Huerta, César||Muñoz-Rojas, David||Huong Nguyen, Viet | ||
| 245 | 0 | _aChapter Spatial Atomic Layer Deposition | |
| 546 | _aEnglish[eng] | ||
| 650 | _achemical vapor deposition, spatial atomic layer deposition (SALD), atmospheric pressure, in-line processing, thin films, transparent conductive materials, fluid dynamics | ||
| 856 | _uhttps://library.oapen.org/bitstream/20.500.12657/49301/1/64743.pdf||https://library.oapen.org/bitstream/20.500.12657/49301/1/64743.pdf | ||
| 942 | _cEB | ||
| 999 |
_c12456 _d12456 |
||