000			01017nam a2200121Ia 4500
008			220615s9999||||xx |||||||||||||| ||und||
245		0	_aAdvances in Chemical Vapor Deposition
546			_aEnglish[eng]
650			_aAPCVD||VO2||processing parameters||2D||chemical vapor deposition||atomic layer deposition||aluminum oxide||aluminum tri-sec-butoxide||thin film||carbon nanotubes||residual gas adsorption||residual gas desorption||field emission||atmospheric pressure CVD||low pressure CVD||hybrid CVD||aerosol assisted CVD||pulsed CVD||perovskite photovoltaic nanomaterials||stabilization||structural design||performance optimization||solar cells||anatase single crystals||process-induced nanostructures||competitive growth||pp-MOCVD||vanadium pentoxide||electrochromic||spray pyrolysis||ammonium metavanadate||CVD||electrochromism||perovskite photovoltaic materials||TiO2||Al2O3||V2O5||computational fluid dynamics
700			_aVernardou, Dimitra
856			_uhttps://mdpi.com/books/pdfview/book/3311
942			_cEB
999			_c12474 _d12474